zenodoopen
Pulsed 193 nm Excimer laser processing of 4H-SiC(0001) wafers with radiant exposure dependent "in situ" reflectivity studies for process optimization.
<p>Conference paper</p>
ShareScore
24/100
Overall dataset sharing score
Score breakdown
These five areas show where the dataset supports — or may limit — practical reuse.
- Stewardship
- 4
- Harmonization
- 0
- Access
- 8
- Reuse readiness
- 8
- Engagement
- 4