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Formation of extended thermal etch pits on annealed Ge wafers -DataSet

<p>Dataset supporting the publication:&nbsp;<a href="https://arxiv.org/ct?url=https%3A%2F%2Fdx.doi.org%2F10.1016%252Fj.apsusc.2018.08.075&amp;v=9dba84e7">10.1016/j.apsusc.2018.08.075</a>&nbsp;<a href="https://arxiv.org/abs/1809.03404">arXiv:1809.03404</a>, including optical microscopy, atomic force microscopy, scanning electron micoscopy</p> <p>&nbsp;</p>

ShareScore

32/100

Overall dataset sharing score

Score breakdown

These five areas show where the dataset supports — or may limit — practical reuse.

Stewardship
4
Harmonization
4
Access
16
Reuse readiness
0
Engagement
8