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11 results for “Atomic layer deposition”
Ferromagnetic resonance of Co thin films grown by atomic layer deposition on the Sb2Te3 topological insulator (data)
<p>This dataset contains the raw data files connected with the figures included in the paper "<em>Ferromagnetic resonance of Co thin films grown by atomic layer deposition on the Sb<sub>2</sub>Te<sub>3</sub> topological insulator</em>" by E. Longo et al., JMMM 209, 166885 (2020): <a href="https://linkinghub.elsevier.com/retrieve/pii/S0304885319336029">https://linkinghub.elsevier.com/retrieve/pii/S0304885319336029</a></p>
5D-NP-FABTECH_ALD - Open Dataset for: "Shedding light on the initial growth of ZnO during plasma-enhanced atomic layer deposition on vapor-deposited polymer thin films"
<p>This is the open dataset for the paper: "Demelius, L. <em>et al.</em> Shedding light on the initial growth of ZnO during plasma-enhanced atomic layer deposition on vapor-deposited polymer thin films. <em>Applied Surface Science</em> <strong>604</strong>, (2022)."</p> <p>This includes the supplementary information and all the source material that was used for the paper preparation.</p> <p>For each folder (sub-dataset), there exists a corresponding readme file describing the content and including material.</p>
Nature of GaOx Shells Grown on Silica by Atomic Layer Deposition
<p>Raw data for the article "Nature of GaOx Shells Grown on Silica by Atomic Layer Deposition", already published in Chemistry of Material.</p>
Highly Conductive Collagen by Low-Temperature Atomic Layer Deposition of Platinum
<p>In modern biomaterial-based electronics, conductive and flexible biomaterials are gaining increasing attention for their wide range of applications in biomedical and wearable electronics industries. The ecofriendly, biodegradable, and self-resorbable nature of these materials makes them an excellent choice in fabricating green and transient electronics. Surface functionalization of these biomaterials is required to cater to the need of designing electronics based on these substrate materials. In this work, a low-temperature atomic layer deposition (ALD) process of platinum (Pt) is presented to deposit a conductive thin film on collagen biomaterials, for the first time. Surface characterization revealed that a very thin ALD-deposited seed layer of TiO2 on the collagen surface prior to Pt deposition is an alternative for achieving a better nucleation and 100% surface coverage of ultrathin Pt on collagen surfaces. The presence of a pure metallic Pt thin film was confirmed from surface chemical characterization. Electrical characterization proved the existence of a continuous and conductive Pt thin film (∼27.8 ± 1.4 nm) on collagen with a resistivity of 295 ± 30 μΩ cm, which occurred because of the virtue of TiO2. Analysis of its electronic structures showed that the presence of metastable state due to the presence of TiO2enables electrons to easily flow from valence into conductive bands. As a result, this turned collagen into a flexible conductive biomaterial.</p>
Computational Data: Accurately computed dimerization trends of ALD precursors and their impact on surface reactivity in area-selective atomic layer deposition
<p><span>The Lewis acidic nature of aluminum atoms in common precursors for the atomic layer deposition (ALD) of Al<sub>2</sub>O<sub>3</sub> can lead to dimerization. This study investigates whether these compounds predominantly exist as monomers or dimers under ALD conditions. Understanding dimerization is crucial for discussing precursor reactivities and other properties, especially in the context of area-selective ALD (AS-ALD). We employed a theoretical approach, incorporating conformer search, density functional theory, and coupled cluster calculations, to determine the dissociated dimer fraction for a range of precursors under typical ALD pressures and temperatures. The precursors studied include aluminum alkyls, chlorinated aluminum alkyls, dimethylaluminumisopropoxide (DMAI), and trisdimethylamidoaluminum (TDMAA). Our findings indicate that aluminum alkyls are completely dissociated over the whole parameter range, while DMAI and TDMAA form stable dimers. Chlorinated precursors were found to exist in both monomeric and dimeric forms depending on temperature and pressure.</span></p>
Data for Publication "Nucleation behavior of SnS2 on thiol functionalized SAMs during solution based atomic layer deposition"
<p>Raw data, reduced data and fitting scripts used to produce figures in publication "Nucleation behavior of SnS2 on thiol functionalized SAMs dur-<br>ing solution based atomic layer deposition", K.Götz et al. in Advanced Materials Interfaces (Wiley), https://doi.org/10.1002/admi.202300990.</p> <p>The data is composed in a .zip file. The zip file contains a folder for each graphic in the publication containing data. In these folders data is filed as "raw data", "reduced data" and "fit script". With the datasets and fit files contained within the .zip folder all data from the publication can be reproduced.</p> <p>The rawdata folders contain the raw data as produced from the used instrument. This consists of:</p> <ul> <li>DESY: Detector tiff images for each scattering angle</li> <li>GIWAXS: Detector tiff images, containing silver behenate measurements for distance calibration.</li> <li>XRR Inhouse: xy-ASCII files in .ras format of RIGAKU.</li> <li>AFM: .tiff image produced by PARKS Systems</li> </ul> <p>The reduced data contains xy-ASCII files of the data reduced to the form presented in the publication.</p> <p>Fit scripts contain the scripts used to fit the data. This consists of:</p> <ul> <li>.hgx files for genX for XRR fits</li> <li>a file structure with scripts to use with the DISCUS suite for the GIWAXS data</li> </ul>
Atom-by-atom design of Cu/ZrOx clusters on MgO for CO2 hydrogenation using liquid-phase atomic layer deposition
<p>Source data for the following publication: </p> <p><strong>Atom-by-atom design of Cu/ZrOx cluster on MgO for CO2 hydrogenation using liquid-phase atomic layer deposition,<em> Nature Catalysis</em>, 2024.</strong></p>
Highly Conductive Collagen by Low-Temperature Atomic Layer Deposition of Platinum
<p>In modern biomaterial-based electronics, conductive and flexible biomaterials are gaining increasing attention for their wide range of applications in biomedical and wearable electronics industries. The ecofriendly, biodegradable, and self-resorbable nature of these materials makes them an excellent choice in fabricating green and transient electronics. Surface functionalization of these biomaterials is required to cater to the need of designing electronics based on these substrate materials. In this work, a low-temperature atomic layer deposition (ALD) process of platinum (Pt) is presented to deposit a conductive thin film on collagen biomaterials, for the first time. Surface characterization revealed that a very thin ALD-deposited seed layer of TiO2 on the collagen surface prior to Pt deposition is an alternative for achieving a better nucleation and 100% surface coverage of ultrathin Pt on collagen surfaces. The presence of a pure metallic Pt thin film was confirmed from surface chemical characterization. Electrical characterization proved the existence of a continuous and conductive Pt thin film (∼27.8 ± 1.4 nm) on collagen with a resistivity of 295 ± 30 μΩ cm, which occurred because of the virtue of TiO2. Analysis of its electronic structures showed that the presence of metastable state due to the presence of TiO2enables electrons to easily flow from valence into conductive bands. As a result, this turned collagen into a flexible conductive biomaterial.</p>
Computational Data - Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition
<p><span><span>Area-selective atomic layer deposition (AS-ALD) shows great potential for meeting the stringent demands of the semiconductor industry for precision nanopatterning. Small molecule inhibitors (SMIs) have recently proven to be a promising, industry-compatible means of achieving AS-ALD. In this work, we compare three nitrogenous aromatic SMIs – aniline, pyrrole, and pyridine – for their ability to block Al</span></span><sub><span><span>2</span></span></sub><span><span>O</span></span><sub><span><span>3</span></span></sub><span><span> ALD on copper with (CuO</span></span><sub><span><span>x</span></span></sub><span><span>) and without (Cu) a native oxide. We find that pyrrole and aniline perform much better as inhibitors than does pyridine. Furthermore, when redosed on copper before every ALD cycle in an ABC scheme, pyrrole and aniline provide outstanding inhibition, facilitating the selective deposition of over 11 nm of Al</span></span><sub><span><span>2</span></span></sub><span><span>O</span></span><sub><span><span>3</span></span></sub><span><span> on an SiO</span></span><sub><span><span>2</span></span></sub><span><span> growth surface in the presence of Cu with 99.9% selectivity. By combining both theory and experiment, we provide new understanding of the mechanisms by which selectivity is prolonged and lost. First, we show that the CuO</span></span><sub><span><span>x</span></span></sub><span><span> surface is inherently more reactive than the Cu surface, leading to an eventual loss of selectivity, even when the inhibitor is redosed. Second, we find that whereas pyrrole and aniline adsorb in a planar bonding orientation, pyridine binds upright at the copper surface and we propose that the upright orientation is the origin of the ineffective inhibition of pyridine. Finally, we observe that redosing of aniline protects the copper surface from undesired oxidation, whereas the redosing of pyridine does not. As such, we posit that a likely benefit of redosing is preventing oxidation and thus reducing reactive site formation during ALD. Through this work, we demonstrate the capability of nitrogenous aromatics to serve as SMIs for AS-ALD, and we contribute valuable insights regarding the impact of ALD process parameters on selectivity. </span></span></p>
Sensors for optical thermometry based on luminescence from layered YVO4: Ln3+ (Ln = Nd, Sm, Eu, Dy, Ho, Er, Tm, Yb) thin films made by atomic layer deposition
<p>Raw and curated data interpreted in the article:</p> <p><em><strong>Sensors for optical thermometry based on luminescence from layered YVO<sub>4</sub>: Ln<sup>3+</sup> </strong></em></p> <p><em><strong>(Ln = Nd, Sm, Eu, Dy, Ho, Er, Tm, Yb) thin films made by atomic layer deposition</strong></em></p>
Atomic Layer Deposition of HfS2 on Functionalized Self-Assembled Monolayers on Ordered Oxide Surfaces: A Model Study under UHV Conditions
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