Tantalum thin films EUVR data

<p>S-polarized Angle-Dependent Reflectance (ADR) data measured from two Tantalum thin films deposited on Silicon substrates&nbsp;using monochromatized synchrotron radiation. The data was collected&nbsp;at the soft X-ray radiometry beamline (SX700) in the radiometry laboratory of the Physikalisch-Technische Bundesanstalt (PTB), in the electron storage facility BESSY II of Helmholtz Centre for Materials and Energy (HZB).&nbsp;The nominal thicknesses for the two thin films were 30.0 nm and 50.0 nm, hence, the .txt data files of the thin films samples are referred to&nbsp;as Sample-30 and Sample-50.</p> <p>The ADR data was collected in the&nbsp;Extreme Ultraviolet (EUV) range. For Sample-30 and Sample-50 the ADR was measured in the spectral ranges 5.0 nm &ndash; 24.0 nm and 10.0 nm &ndash; 20.0 nm, respectively. The EUVR of Sample-30 correspond to the angular range&nbsp;3.0&deg; &ndash; 85.5&deg;.&nbsp;The EUVR of Sample-50 correspond to the angular range&nbsp;4.5&deg; &ndash; 87.0&deg;.</p> <p>The .txt files contain post-processed reflectance values each with its calculated absolute uncertainty.&nbsp;</p>