In situ clamped beam bending of physical vapor deposited Cu/Nb nanolaminate with 20 nm individual layer thickness

<p>In situ scanning electron microscope (SEM) videos of clamped beam bending of Cu/Nb PVD nanolaminate&nbsp;with 20 nm layer thickness and 42+-10 nm grain size at the surface layer.&nbsp;Each video contains the video captured with SEM and the corresponding measured load vs. displacement curve.</p> <p>The beams were fabricated using focused ion beam (FIB) milling from the Cu/Nb sample produced in Los Alamos National Lab, USA. The sample was made using magnetron sputtering, described in ref. [1].&nbsp;</p> <p>Each beam has a rectangular notch located in the center of the beam length. Each notch spans through the beam width. &nbsp;Owing to limited accuracy of FIB, the notch depth was not always same at the front and rear sides of the beam (typically, smaller at the rear sides)</p> <p>Beam geometries:</p> <p>Id | Length, &micro;m | Width, &micro;m | Thickness, &micro;m | Notch depth (front), nm | Notch width (front), nm</p> <p>PVD1 | 29 | 5 | 1.6 | 380 | 120</p> <p>PVD2 | 29 | 5 | 1.5 | 290 | 305</p> <p>All the beams were loaded using Hysitron PI85 picoindenter with truncated cone shape (5 &micro;m diameter). The indenter tip was aligned with the notch location and the middle of beam width.&nbsp;</p> <p>All the beams were loaded under displacement control with displacement rates between 2nm/s to 10nm/s until failure.</p> <p>The SEM videos were captured using JEOL JSM-7600F SEM.&nbsp;</p> <p>[1] D. Bhattacharyya et al. &ldquo;Transmission electron microscopy study of the deformation behavior of Cu/Nb and Cu/Ni nanoscale multilayers during nanoindentation&rdquo;. In: Journal of Materials Research 24.3 (2009), pp. 1291-1302.&nbsp;</p>