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2 results for “nanolaminate”

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zenodo44/100

Data repository for "Interface rotation in Cu/Nb accumulative roll bonded (ARB) nanolaminates"

<p>Data repository for &quot;Interface rotation in Cu/Nb accumulative roll bonded (ARB) nanolaminates&quot;</p> <p>This repository contains raw experimental data for &quot;Interface rotation in Cu/Nb accumulative roll bonded (ARB) nanolaminates&quot; manuscript. Please refer to the manuscript for the data interpretation.</p> <p>The repository structure:</p> <ul> <li><code>CuNbARB-sample-photo.jpg</code> shows a photograph of as-received Cu(63nm)/Nb(63nm) accumulative roll bonded (ARB) nanolaminate sample</li> <li><code>ARB_63nm_DRX</code> contains X-ray diffraction measurements</li> <li><code>RD/TDXFIBmilling</code> folders contain focused ion beam images captured during pillar milling <ul> <li>In <code>RDX/TDX</code>, <code>X</code> refers to pillar number (see Supplementary information.org for the full pillar list). The numbers in the file names inside refer to the corresponding pillars.</li> </ul> </li> <li><code>RD/TDXSEMbefore</code> folders contain scanning electron (SEM) images of the as-fabricated pillars</li> <li><code>RD/TDX-compression</code> folders contain in situ pillar compression data, including some of the SEM images captured before/after the compression, raw load-displacement data (in <code>.hys</code> native Hysitron piconindenter format), load-displacement data exported to raw text (see Supplementary information for examples how to plot load-displacement using the raw text files), SEM videos, SEM videos combined with the load-displacement data, and accelerated videos</li> <li><code>RD/TDX-SEMafter</code> folders contain SEM images of the compressed pillars</li> <li>Supplementary-info folder contains supplementary information</li> </ul> <p>Author: I. Radchenko, W. Zhu, L. Qing, E. Navarro, R. Sahay, P.S. Lee, N. Raghavan, O. Thomas, A.S. Budiman, K. Chen</p>

opencc-by-4.0Apr 2022View details →
zenodo36/100

In situ clamped beam bending of physical vapor deposited Cu/Nb nanolaminate with 20 nm individual layer thickness

<p>In situ scanning electron microscope (SEM) videos of clamped beam bending of Cu/Nb PVD nanolaminate&nbsp;with 20 nm layer thickness and 42+-10 nm grain size at the surface layer.&nbsp;Each video contains the video captured with SEM and the corresponding measured load vs. displacement curve.</p> <p>The beams were fabricated using focused ion beam (FIB) milling from the Cu/Nb sample produced in Los Alamos National Lab, USA. The sample was made using magnetron sputtering, described in ref. [1].&nbsp;</p> <p>Each beam has a rectangular notch located in the center of the beam length. Each notch spans through the beam width. &nbsp;Owing to limited accuracy of FIB, the notch depth was not always same at the front and rear sides of the beam (typically, smaller at the rear sides)</p> <p>Beam geometries:</p> <p>Id | Length, &micro;m | Width, &micro;m | Thickness, &micro;m | Notch depth (front), nm | Notch width (front), nm</p> <p>PVD1 | 29 | 5 | 1.6 | 380 | 120</p> <p>PVD2 | 29 | 5 | 1.5 | 290 | 305</p> <p>All the beams were loaded using Hysitron PI85 picoindenter with truncated cone shape (5 &micro;m diameter). The indenter tip was aligned with the notch location and the middle of beam width.&nbsp;</p> <p>All the beams were loaded under displacement control with displacement rates between 2nm/s to 10nm/s until failure.</p> <p>The SEM videos were captured using JEOL JSM-7600F SEM.&nbsp;</p> <p>[1] D. Bhattacharyya et al. &ldquo;Transmission electron microscopy study of the deformation behavior of Cu/Nb and Cu/Ni nanoscale multilayers during nanoindentation&rdquo;. In: Journal of Materials Research 24.3 (2009), pp. 1291-1302.&nbsp;</p>

opencc-by-4.0Jun 2018View details →

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