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70 results for “etching”

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zenodo48/100

Etching of Nitrides-NbN Heterostructures

<p>Niobium Nitride (NbN) is metallic at room temperature. NbN / III-N heterostructures are of interest for<br> new devices applications such as the Metal Base Transistor (MBT). Niobium Nitride etching in fluorine plasma is documented by Reactive Ion Etching (RIE). In this document we present the etching of a III-Nitride NbN heterostructure with fluorine<br> chemistry Inductively Coupled Plasma (ICP).</p>

opencc-by-4.0Oct 2022View details →
zenodo48/100

The role of etching anisotropy in the fabrication of freestanding oxide microstructures on SrTiO3(001), SrTiO3 (110), and SrTiO3 (111) substrates

<p>Datafiles for the Figures and Supplementary Material of the article &quot;The role of etching anisotropy in the fabrication of freestanding oxide microstructures on SrTiO3(001), SrTiO3 (110), and SrTiO3 (111) substrates&quot; published in Applied Physics Letters by Alejandro E. Plaza et al. (2021)</p>

opencc-by-4.0Jul 2021View details →
zenodo44/100

Global trends and collaborations in electrochemical methods: a dataset on etching and deposition research

<p><span>This dataset supports the study "Electrochemical Etching vs. Electrochemical Deposition: A Comparative Bibliometric Analysis," which examines scientific publications on electrochemical etching and electrochemical deposition from 1970 to 2023. The dataset is derived from the Science Citation Index Expanded (SCIE) database and includes bibliometric information on publication trends, leading contributors, research areas, and keyword co-occurrences in both fields.</span></p>

opencc-by-4.0Aug 2024View details →
zenodo44/100

Plasma etching for fabrication of complex nanophotonic lasers from bonded InP semiconductor layers

<p>Integrating optically active III-V materials on silicon/insulator platforms is one potential path towards improving the energy efficiency and performance of modern computing. Here we demonstrate the applicability of direct wafer bonding combined with plasma etching to the fabrication of complex nanophotonic systems out of InP layers. We explore and optimise the plasma etching of InP, validating existing processes and developing improved ones. We explore the use of microdisk lasing as a way to evaluate fabrication fidelity, and demonstrate that we can create complex lasing systems of interest to us: coupled disk cavities and random network lasers.</p> <p><strong>This repository contains data used to generate figures in <a href="https://doi.org/10.1016/j.mne.2023.100196">https://doi.org/10.1016/j.mne.2023.100196</a>.</strong></p>

opencc-by-4.0Jul 2023View details →
zenodo40/100

Ultrasound scans of wind turbine bearings with white etching crack damage

<p>A set of ultrasound images of wind turbine bearings with white etching crack subsurface damage. Attenuation levels above -10 dB indicate subsurface damage. Five tests were run under constant loading in a laboratory test rig, with two bearings in parallel. Tests were stopped at the indicated times (in hours) when vibration levels went above a certain threshold. This typically means that one of the two bearings has failed, although this is somewhat inconclusive for the fifth test where both bearings seem to be close to failure. For each bearing two sides were scanned (indicated by A and H).</p> <p>The experiment was performed in summer-autumn 2017 by DTU Wind Energy, as part of the FP7 Integrated Research Programme in the field of Wind Energy (IRPWIND), 2nd Round of Joint Experiments.</p> <p>For more information about this dataset please contact Dr Hilmar Danielsen at DTU Wind Energy.<br> &nbsp;</p> <p>&nbsp;</p>

opencc-by-nc-4.0Dec 2017View details →
zenodo40/100

Fig. 5. SEM micrographof planed and etched I2 in Single origin of Malagasy Carnivora from an African ancestor.

Fig. 5. SEM micrographof planed and etched I2 enamel of Plagiaulacinae gen. et sp. indet. DORCM GS 8, Purbeck Limestone Formation (from Fosse et al. 1991). There are numerous large round, barnacle−like structures varying in form and size, eachseemingly consisting of crystals converging to − ward the outer enamel surface and surrounding an often slit−like opening from which a filamentous structure may protrude. Between them are much smaller circular crystal aggregates. Scale bar 10 µm.

opencc-by-4.0Nov 2003View details →
zenodo40/100

Dataset for "Laser-Assisted Etching of EagleXG Glass by Irradiation at Low Pulse-Repetition Rate"

<div>This dataset contains the raw data at the basis of the graphs and pictures reported in the paper:</div> <div>"Laser-assisted etching of EagleXG glass by irradiation at low pulse-repetition rate"</div> <div>by Roberto Memeo, Mattia Bertaso, Roberto Osellame, Francesca Bragheri and Andrea Crespi.</div> <div>&nbsp;</div> <div>This paper is published as:</div> <div>Appl. Sci. 2022, 12(3), 948.&nbsp; https://doi.org/10.3390/app12030948</div> <div>&nbsp;</div> <div>Each folder refers to the corresponding picture in the published paper and contains the .pdf file of the picture itself and the .csv file of the raw data for the graphs, if present.</div>

opencc-by-4.0Sep 2024View details →
zenodo40/100

Text-fig. 7. Enamel microstructure in the molars of (a) Allosorex stenodus (KOE-4196 / Z 28207 – OF 6512) and (b) Blarina brevicauda (KOE-1435). SEM photos showing transverse sections of the paralophid in a lower molar. The schmelzmuster of Allosorex is one-layered and formed exclusively from radial enamel (RE), whereas the schmelzmuster of Blarina is two-layered, with an inner enamel of laterally inclined radial enamel with distinct interrow sheets (REIS). The radial enamel of the outer layer is heavily pigmented and therefore poorly etched. The pigmentation does not affect the schmelzmuster. in Allosorex Stenodus Fejfar, 1966 (Eulipotyphla, Soricidae): Re-Description Of Type Material And Re-Interpretation Of Its Fossil Record

Text-fig. 7. Enamel microstructure in the molars of (a) Allosorex stenodus (KOE-4196 / Z 28207 – OF 6512) and (b) Blarina brevicauda (KOE-1435). SEM photos showing transverse sections of the paralophid in a lower molar. The schmelzmuster of Allosorex is one-layered and formed exclusively from radial enamel (RE), whereas the schmelzmuster of Blarina is two-layered, with an inner enamel of laterally inclined radial enamel with distinct interrow sheets (REIS). The radial enamel of the outer layer is heavily pigmented and therefore poorly etched. The pigmentation does not affect the schmelzmuster.

opencc-by-4.0Nov 2020View details →
zenodo36/100

Image analysis data for the study of the reactivity of the phases in Nd-Fe-B magnets etched with HCl-saturated Cyphos IL 101

<p>Scanning electronic microscopy (SEM), Energy dispersive X-rays Spectroscopy (EDS) and image analysis have been used as techniques to analyse the results of etching experiments carried on NdFeB permanent magnets by using the ionic liquid Cyphos IL 101 saturated with HCl. Image analysis is for the first time reported in the literature as a technique for corrosion studies.</p> <p>Operational conditions of the analysis equipment were the following:</p> <p>-&nbsp;&nbsp;The samples were analyzed via electron microscopy and image analysis. Scanning electron microscope (SEM) pictures and energy dispersed spectra (EDS) were collected with a JEOL JSM 5800 microscope, operating at 20 kV. The polished samples were made conductive by spraying a carbon layer on them using a Balzer SCD 050 sputter coater.</p> <p>- The EDS analysis were collected as average on 5 points per each SEM picture</p> <p>-&nbsp;A commercial software, ImageJ&reg;, was used for the image analysis.&nbsp;Two data were analysed: the Feret diameter, d<sub>F</sub>, and the percentage of etched area, %area. The SEM images were converted to 8-bit grayscale, from 0 to 255 number of grey ranges. Simple linear scaling was applied</p>

opencc-by-nc-4.0Apr 2020View details →
zenodo36/100

Ga interaction with ZnO surfaces: diffusion and melt-back etching_experimental dataset

<p>This archive contains the raw unfileterd data to the Pejchal et al.,&nbsp;Ga interaction with ZnO surfaces: diffusion and melt-back etching,&nbsp;<a href="https://www.sciencedirect.com/journal/applied-surface-science">Applied Surface Science</a>,&nbsp;<a href="https://www.sciencedirect.com/journal/applied-surface-science/vol/583/suppl/C">Volume 583</a>,&nbsp;1 May 2022, 152475.&nbsp;</p>

opencc-by-4.0Feb 2022View details →
zenodo36/100

Selective enamel etching: What level of accuracy is achievable in simulated clinical conditions?

<p>Dataset of a laboratory study assessing the accuracy of selective enamel etching</p>

opencc-by-4.0Aug 2022View details →
ClinicalTrials.gov36/100

A Novel Remineralizing Self-Etch Primer for Orthodontic Bracket Bonding

ClinicalTrials.gov study NCT07291830. IPD Sharing: NO. Countries: 1. Publications: 2.

closedIPD-NOFeb 2026View details →
ClinicalTrials.gov36/100

Effect of Phosphoric Acid Etching Duration on Direct Resin-Based Composite Restorations in Permanent Anterior Teeth

ClinicalTrials.gov study NCT06991842. IPD Sharing: UNDECIDED. Countries: 1. Publications: 4.

restrictedIPD-UNDECIDEDFeb 2026View details →
ClinicalTrials.gov36/100

NCCL Direct Composite Restoration Performance With Self-Etch and Multimode Adhesives

ClinicalTrials.gov study NCT02698371. IPD Sharing: NO. Countries: 1. Publications: 9.

closedIPD-NOFeb 2026View details →
zenodo32/100

Data for: Atomistic description of Si etching with HCl

<p>Dataset with all the CONTCAR files of the minima and TS of the DFT simulations. The computational details are given in the manuscript.&nbsp;</p>

opencc-by-4.0Nov 2023View details →
dryad32/100

A statistical method to optimize the chemical etching process of Zinc Oxide thin films

<p>Zinc Oxide (ZnO) is an attractive material for micro and nanoscale devices. Its desirable semiconductor, piezoelectric, and optical properties <span>make</span> it useful in applications ranging from microphones to missile warning systems to biometric sensors. This work introduces a demonstration of blending statistics and chemical etching of thin films to identify the dominant factors, and interaction between factors, and <span>develop</span> statistically enhanced models on etch rate and selectivity of ZnO thin films. Over other mineral acids, ammonium chloride (NH<sub>4</sub>Cl) solutions <span>have</span> commonly been used to <span>wet</span> etch microscale ZnO devices because of their controllable etch rate and near-linear behavior. <span>Etchant</span> concentration and temperature were found to <span>have</span> a significant effect on etch rate. Moreover, this is the first demonstration that has identified multifactor interactions between temperature and concentration and between temperature and agitation. A linear model <span>was</span> developed relating etch rate and its variance against these significant factors and multifactor interactions. An average selectivity of 73:1 <span>was </span>measured with none of the experimental factors having a significant effect on the <span>selectivity. </span>This statistical study captures the significant variance observed <span>by</span> other researchers. <span>Furthermore,</span> it enables statistically enhanced microfabrication processes for other materials.</p>

opencc-zeroNov 2021View details →
zenodo32/100

Raw Data for "Chemical etching of Sb2Se3 solar cells: surface chemistry and back contact behaviour"

<p>Raw Data for &quot;Chemical etching of Sb2Se3 solar cells: surface chemistry and back contact behaviour&quot;.&nbsp;<br> <a href="https://doi.org/10.1088/2515-7655/ab3c98">https://doi.org/10.1088/2515-7655/ab3c98</a>.</p>

opencc-by-4.0Aug 2019View details →
zenodo32/100

Formation of extended thermal etch pits on annealed Ge wafers -DataSet

<p>Dataset supporting the publication:&nbsp;<a href="https://arxiv.org/ct?url=https%3A%2F%2Fdx.doi.org%2F10.1016%252Fj.apsusc.2018.08.075&amp;v=9dba84e7">10.1016/j.apsusc.2018.08.075</a>&nbsp;<a href="https://arxiv.org/abs/1809.03404">arXiv:1809.03404</a>, including optical microscopy, atomic force microscopy, scanning electron micoscopy</p> <p>&nbsp;</p>

opencc-by-4.0Dec 2018View details →
zenodo32/100

Data for Deep Reactive Ion Etching of Cylindrical Nanopores in Silicon for Photonic Crystals

<p>Data for Deep Reactive Ion Etching of Cylindrical Nanopores in Silicon for Photonic Crystals</p>

opencc-by-4.0Nov 2022View details →
zenodo32/100

Polarisation-independent ultrafast laser selective etching processing in fused silica

<p>Data files for the manuscript: Polarisation-independent ultrafast laser selective etching processing in fused silica</p>

opencc-by-4.0Sep 2022View details →

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Allen Brain Atlas

Allen Brain Atlas is an Allen Institute collection of brain map atlases, datasets, APIs, and analysis tools covering mouse, human, and non-human primate brain resources.

allen-brain-atlas
neuroscienceopenDocumentation, web resources, and API references are available online.
Last verified 2026-04-30Open record

Annotated Behaviour and Observability Dataset (ABODe)

ABODe is a University of Edinburgh DataShare dataset for behavior classification in group-housed mice using home-cage video, identities, bounding boxes, ground-plate positions, and annotator labels.

abode-home-cage
behavioral-neuroscienceopenThe DataShare record exposes download links for annotations, documentation, license text, and the zipped per-snippet data directory.
Last verified 2026-04-30Open record

DANDI Archive for NWB datasets

DANDI is a BRAIN Initiative archive for publishing and sharing neurophysiology data, including electrophysiology, optophysiology, and behavioral data packaged as NWB and related standards.

dandi-nwb
electrophysiologyopenPublished Dandiset metadata and archive endpoints are available through the production DANDI API.
Last verified 2026-04-30Open record

International Brain Laboratory public data

The International Brain Laboratory public data releases expose standardized mouse decision-making experiments, including Neuropixels recordings, widefield calcium imaging, behavior, and session metadata accessed through the ONE API.

ibl
behavioral-neuroscienceopenPublic sessions can be searched and loaded from the IBL public data server through ONE.
Last verified 2026-04-29Open record

OpenNeuro

OpenNeuro is a free, open platform for sharing neuroimaging datasets, with public search, dataset pages, and download paths for web, S3, DataLad, and the OpenNeuro CLI.

openneuro
neuroscienceopenPublished datasets are available on demand over the internet.
Last verified 2026-04-29Open record