SU-8 Developer Solution — 25-Pack
Pack of 25.
Developer for SU-8 negative photoresist: dissolves the unexposed resist after exposure and leaves the cross-linked pattern. Propylene glycol monomethyl ether acetate (PGMEA), over 99.5%.
Louise Corscadden, PhD
Director of Science · ConductScience
Ask Louise about SU-8 Developer Solution — 25-Pack fit, setup, configuration, or quote prep.
Already working with us? Sign in to connect this with My Scientist.
Key Specifications
Full details →- SKU family
- WHM-0164-25PK
- Shipping box
- 181.8 × 136.3 × 90.9 cm
- Ordering
- Quote-reviewed before fulfillment
- Category
- Lab Equipment
SU-8 Developer removes the unexposed areas of SU-8 photoresist after exposure. Exposed SU-8 is cross-linked and does not dissolve, so the developed wafer carries the reverse of the mask pattern, as used for SU-8 molds in PDMS soft lithography.
Develop in a fume hood: immerse the wafer, keep the developer moving, and rinse with fresh developer while a colored sheen remains; then rinse with deionized water and dry with nitrogen.
Specifications
- Composition: 1-methoxy-2-propyl acetate (PGMEA, CAS 108-65-6), over 99.5%; 2-methoxy-1-propyl acetate, under 0.5%
- Use: developing SU-8 negative photoresist
Pack of 25. Sold by quote: this is a hazardous chemical, so contact us for availability and shipping before ordering.
Shipping weight
- 3.3 lb
Shipping box
- L: 181.8 cm
- W: 136.3 cm
- H: 90.9 cm
No Q&A yet. Have a question? Ask below.
Have a question about this product?
Have a question? Just ask.
Send it over and we'll email you a personalized answer, with no call or scheduling.
Prefer to talk it through?
