Line edge & width roughness (LER / LWR)
Line edge and line width roughness as 3-sigma deviation along patterned lines.
Example outputs shown for illustration. Numbers depend on your samples and protocol.
What you get
The measurement, today
Edge roughness is estimated by eye or from a short manual trace. The sampling is too small to be stable, and the number depends on who drew the trace.
What it costs
Roughness that survives to the transistor gate spreads threshold voltage across a die. At advanced nodes it is a direct performance and yield limiter, and it is invisible to a coarse CD measurement.
From image to reviewed result
- 1
Image the lines
Load top-down SEM images of the patterned lines.
- 2
Extract the edges
Both edges of each line are traced sub-pixel along the full imaged length.
- 3
Compute deviation
Edge position deviation gives LER; width deviation gives LWR, each as a 3-sigma value.
- 4
Report the spectrum
A power spectral density and correlation length accompany the per-line table.
Scope: Computes roughness statistics from detected edges in your image. Values depend on pixel size and edge-detection settings; hold them fixed to compare across samples.
Related applications
Semiconductor defect patterns
Classify wafer-map patterns and quantify defect clusters and densities.
Critical dimension (CD) metrology
Line width, space, and via diameter measured from top-down images, with per-feature tables.
Photoresist pattern defects
Detect resist pattern collapse, bridging, footing, and scumming after develop.
Send a sample image and a measurement goal
We will show the closest ConductVision workflow and flag what needs custom validation for your images.
